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Reticle / mask layout “reticle” also means a glass mask plate, but on a stepper The patterns on the reticles are transferred to the wafer through a projection process. Can place a number of different patterns onto the reticle, and then programmatically choose which ones will be shot onto the wafer, and where on the wafer they will be exposed.

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The term “reticle” was used to described a “master template” used in a 2x, 4x or 5x reduction stepper Reticles are transparent masks used in photolithography, a process in semiconductor manufacturing, to define patterns on a wafer Today, the terms “photomask” and “reticle” are used interchangeably.

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A reticle, on the other hand, referred to a single layer of pattern that covers a small portion of the wafer

A reticle has to be stepped and repeated in order to expose the entire wafer. Reticles, or photomasks, contain the circuit pattern for each chip layer Inspections are routinely performed during the reticle manufacturing process and throughout the reticle usage Reticle inspection tools employ sophisticated image analysis software and motion control systems similar to those used in wafer inspection tools.

A photomask used in creating layers on a chip that is repeated (stepped) across the wafer The wave id® plus card reader integrates with most applications via a keystroking or an sdk model Find out how it supports proximity and contactless smart cards.